Imec has demonstrated the capability of directed self-assembly (DSA) to pattern line/spaces with a pitch as small as 18nm, using a high-chi block copolymer (high-χ BCP) based process under high volume ...

There are still some problems to work out, such as cutting defect rates, but directed self-assembly has the potential to reduce the total number of masks. The upcoming 7nm process node presents tough ...

Through microphase separation, block copolymers (BCPs) can self-assemble into highly uniform, chemically distinct, periodic domains with dimensions and periods at scales of 3–200 nm 1,2 that are ...

As previous articles in this series have shown, directed self-assembly may be a promising alternative for manufacturers seeking to shrink feature sizes in the face of a stalled exposure tool roadmap.

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